Electron subband dispersions in ultra-thin silicon films from a two-band k·p theory

نویسندگان

  • Viktor Sverdlov
  • Siegfried Selberherr
چکیده

The electron subband structure in a thin (100) silicon film is analyzed based on a two-band k·p theory. For unprimed subbands the dependence of the nonparabolicity parameter on film thickness is obtained. The two-band k·p theory gives a thickness dependence of the effective masses for primed subbands. Limitations of the model are discussed. The importance of the nonparabolicity parameter dependence on the film thickness for transport is demonstrated.

برای دانلود متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

ثبت نام

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

منابع مشابه

Mobility Modeling in Advanced MOSFETs with Ultra-Thin Silicon Body under Stress

Mobility in advanced MOSFETs with strained ultra-thin silicon body is investigated. We use a two-band k·p model to describe the subband structure in strained silicon thin films. The model provides the dependence of the conductivity effective mass on strain and film thickness. The conductivity mass decreases along tensile stess in [110] direction applied to a (001) silicon film. This conductivit...

متن کامل

Strain-Controlled Valley Splitting in Si-SiGe Heterostructures

A splitting between equivalent valleys larger than the spin splitting was recently reported in a gate confined electron system in thin Si films grown on SiGe substrate [1]. This degeneracy lifting reduces scattering and improves the coherence time. The valley splitting larger than the spin splitting opens a way to build spin qubits, which makes silicon-based quantum devices promising for future...

متن کامل

Electron subband structure and controlled valley splitting in silicon thin-body SOI FETs: Two-band k·p theory and beyond

Article history: Received 17 March 2008 Received in revised form 28 April 2008 Accepted 13 June 2008 Available online 26 October 2008 The review of this paper was arranged by Dimitri Lederer and Jean-Pierre Colinge

متن کامل

Impact of Confinement of Semiconductor and Band Engineering on Future Device Performance

A rigorous analysis of the subband structure in thin silicon films under stress is performed. Calculated subband effective masses are shown to depend on shear strain and thickness simultaneously. The effective masses and the subband splitting determine transport in silicon films. Decrease of the transport effective mass controlled by the shear strain component guarantees mobility enhancement ev...

متن کامل

Impact of Confinement and Stress on the Subband Parameters in Ultra-Thin Silicon Films

The subband structure in thin silicon films under stress is rigorously analyzed. Calculations of the effective masses in the subbands show a dependence on shear strain and film thickness simultaneously. Both, the effective masses and the subband splitting determine the transport properties in silicon films. A decrease of the transport effective mass controlled by the shear strain component lead...

متن کامل

ذخیره در منابع من


  با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید

برای دانلود متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

ثبت نام

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

عنوان ژورنال:

دوره   شماره 

صفحات  -

تاریخ انتشار 2007